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Gary Masato Fukasawa - Advanced Background Checks
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One of the largest people directories for white pages information. Gary Masato Fukasawa (Age 75) living in Columbia, MO ( )
WhitePages: J Fukasawa | Whitepages
... to live in Ballwin MO, Columbia MO, Pasadena CA, La Crescenta CA, Springfield MO, Tujunga CA; Related to G Fukasawa, Gary Masato Fukasawa, ...
People Record For Gary Masato Fukasawa
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See who owns (818) with a free people search from AdvancedBackgroundChecks.com. Get details about the owner with our extensive background ...
Janice Galye Oehrle | Age - Advanced Background Checks
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4 Possible Relatives. Gary Masato Fukasawa. Age 76. Gary Oehrl. Oehrle Tr Fukasawa. Of Oehrle Fukasawa. 8 Known Addresses Abella La Crescenta ...
Interests
Masato Fukasawa - Patents
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Recent bibliographic sampling of Masato Fukasawa patents listed/published in the public domain by the USPTO (USPTO Patent Application #,Title):
Masato Fukasawa, Inventor, Ibaraki, JP
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Masato Fukasawa's Inventor profile, Chiyoda-ku, Tokyo, JP47 patents/applications from Nov 01, to Jul 26, 2017, 256 forward patent citations, CLEANING...
Hitachi Chemical Company Ltd patent inventors (2015)
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Masato Fukasawa · Masato Miyatake · Masato Yoshida · Masato Yoshida · Masatoshi Morishita · Masaya Nishiyama · Masayoshi Arakawa · Masayoshi Mori
Reports & Statements
JAGUAR & Daimler Owners Club Membership List.
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454, まさ, Masato FUKASAWA, Daimler DoubleSix 5.3, 1991, RHD, Yamanashi. 453, おいら, Daisuke MURAI, Daimler Super V8 4.0, 2000, RHD, Miyagi.
Miscellaneous
EP A2 - Plaque électrophotographique Google Patents
patents.google.com
Inventeurs, Keiichi Endo, Yasushi Shinbo, Akira Kageyama, Yasuo Katsuya, Chihiro Kato, Masato Fukasawa, Makoto Sekine. Déposant, Hitachi Chemical Co. , ...
US A - Electrophotographic plate including an undercoating...
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In an electrophotographic plate, that having an undercoating layer with smooth surface when observed by using a scanning electron microscope and an...
Masato Fukasawa, Hitachi-Shi JP - Patent applications
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Patent application number Description Published; : POLISHING LIQUID FOR METAL FILM AND POLISHING METHOD - The invention relates to a polishing liquid for
Masato Fukasawa, Ibaraki JP - Patent applications
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Patent application number Description Published; : CMP polishing slurry and polishing method - The present invention relates to a CMP polishing slurry
ClaimParse | Patent
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Title, Cmp Polishing Slurry And Method Of Polishing Substrate. Inventorship, Masato Fukasawa, Hitachi (JP) Naoyuki Koyama, Hitachi (JP)
WO A1 - Polishing agent for silicon oxide, liquid additive,...
patents.google.com
Hitachi Chemical Co Ltd, Masaya Nishiyama, Masato Fukasawa, Toshiaki Akutsu, Kazuhiro Enomoto, Toranosuke Ashizawa, Yuuto Ootsuki: Esporta citazione: BiBTeX, EndNote
US A - Process for preparing water soluble polymer gels...
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A process for preparing high molecular weight water soluble polymer gels having relatively narrow molecular weight distributions is disclosed. An aqueous...
WO A1 - Cmp polishing compound and polishing method...
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A CMP polishing compound which comprises cerium oxide particles, a dispersant, a water-soluble polymer and water, wherein the water-soluble polymer is a...
A ladder polysilane wrapped with amylose
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... wrapped with amylose. Auteur(s) / Author(s). KATO Nobu ; SANJI Takanobu ; TANAKA Masato ; FUKASAWA Tetsuya ; ISHIDA Shintaro ; KYUSHIN Soichiro ; ...
US A1 - Cmp polishing compound and polishing method...
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The present invention relates to a CMP polishing slurry, comprising cerium oxide particles, a dispersing agent, a water-soluble polymer and water,...
WO A1 - Polishing fluid and polishing method
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A polishing fluid which comprises at least one of a surfactant and an organic solvent, an oxidized metal dissolving agent and water, or comprises...
EP A4 - Metal film polishing liquid and polishing method...
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Inventors, Kouji Haga, Masato Fukasawa, Jin Amanokura, Hiroshi Nakagawa. Applicant, Hitachi Chemical Co Ltd. Export Citation, BiBTeX, EndNote, RefMan.
WO A1 - Cmp polishing agent and method for polishing...
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Disclosed is a CMP polishing agent containing cerium oxide particles, a dispersing agent, a water-soluble polymer and water wherein the water-soluble...
WO A2 - Compositions de suspension de polissage...
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Masato Fukasawa: CMP Abrasive Slurry for Polishing Insulation Film, Polishing Method, and Semiconductor Electronic Part Polished by the Polishing Method
EP A2 - Elektrophotographische Platte Google Patents
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Inventors, Keiichi Endo, Yasushi Shinbo, Akira Kageyama, Yasuo Katsuya, Chihiro Kato, Masato Fukasawa, Makoto Sekine. Applicant, Hitachi Chemical Co. , Ltd ...
EP A1 - Liquide de polissage de film métallique et procédé de...
patents.google.com
The invention relates to a polishing liquid for metal film comprising 7.0% by weight or more of an oxidizer for metal, a water-soluble polymer, an oxidized...
US B1 - Endpoint detection by chemical reaction and light...
patents.google.com
US *, 13 Sep 2007, 21 Jan 2010, Masato Fukasawa, Cmp polishing slurry, additive liquid for cmp polishing slurry, and substrate-polishing ...
EP A2 - Dry toner, dry developer and process for forming images...
patents.google.com
... Ryouji Tan, Takashi Ikeda, Tetsuya Fujii, Chiaki Okada, Osamu Ikenogawa Apartment C-202 Higashida, Hatuo Minamidai 7-4 Sugitani, Masato Fukasawa.
WO A1 - 絶縁膜研磨用ｃｍｐ研磨剤、研磨方法、該研磨方法で研磨された半導体電子部品
patents.google.com
層間絶縁膜、ＢＰＳＧ膜、シャロー・トレンチ分離用絶縁膜や配線間の絶縁膜層を平坦化するＣＭＰ技術において、ＳｉＯ２膜やＳｉＯＣ膜といった絶縁膜の研磨を効率的かつ高速に行うことができる絶縁膜研磨用高速ＣＭＰ研磨剤、このＣＭＰ研磨剤を用いて研磨する研磨方法、該研磨方法で研磨された半導体電子部品を提供する。酸化セリウム粒子、分...
EP A1 - Chemical-mechanical polishing liquid, and semiconductor...
patents.google.com
The first embodiment of the CMP polishing liquid of the invention comprises cerium oxide particles, an organic compound with an acetylene bond, and water, the...
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